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Let us help you with your inquiries, brochures and pricing requirements Physical Vapor Deposition Equipment
The TriAxis electron beam evaporation system includes a 304 stainless steel cylindrical chamber with a typical size range 18 or 24 inch diameter and is scaled to match the specific application. The pumping is turbo molecular or cryogenic. The load lock involves manual or automatic transfer and high vacuum pumping. It accommodates small samples of a number of shapes and sizes. PLC/PC-based process automation is possible with graphic user interface, data logging, recipe control and remote e-support.
The key features of the evaporation system are:
CAPOS - Vacuum Deposition Platform by Semicore
SC 1500 Inline Sputtering System from Semicore
SC 250/450 Sputtering System from Semicore
SC3500 Evaporation System from Semicore
The Advanced SC450 Sputtering System for Thin Film Vacuum Deposition Systems
The High Performance SC450-LL Sputtering System from Semicore
The Triaxis Sputtering System from Semicore
TriAxis Thin Film Deposition System from Semicore
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